Comments for SisuSemi https://www.sisusemi.com/ Atomic-Level Semiconductor Cleaning Solution Fri, 25 Sep 2026 05:22:16 +0000 hourly 1 https://wordpress.org/?v=7.1.2 Comment on ALP™ – Atomic Level Purification by When the Foundation Cracks: How Pre-ALD Surface Defects Undermine Atomic Layer Deposition - SisuSemi https://www.sisusemi.com/blog/alp-atomic-level-purification-3nm-interface-engineering/#comment-64 Fri, 25 Sep 2026 05:22:16 +0000 https://www.sisusemi.com/?p=919#comment-64 […] ALP is not another cleaning step bolted onto the existing wet-clean-plus-plasma sequence. It is an ultra-high-vacuum, temperature-controlled purification and stabilization process applied upstream of ALD, designed to reset the silicon surface to a genuinely low-defect […]

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