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	<title>KimWesterlund, Author at SisuSemi</title>
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	<description>Atomic-Level Semiconductor Cleaning Solution</description>
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	<title>KimWesterlund, Author at SisuSemi</title>
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		<title>Advancing Semiconductor Performance: An Effective and Cost-Efficient Breakthrough</title>
		<link>https://www.sisusemi.com/blog/advancing-semiconductor-performance-an-effective-and-cost-efficient-breakthrough/</link>
		
		<dc:creator><![CDATA[KimWesterlund]]></dc:creator>
		<pubDate>Thu, 20 Feb 2025 09:10:14 +0000</pubDate>
				<category><![CDATA[Blog]]></category>
		<guid isPermaLink="false">https://sisusemi.iwn.co/?p=11</guid>

					<description><![CDATA[<p>The semiconductor industry is the backbone of modern technology, powering everything from smartphones to medical devices. To tackle these opportunities, the chip industry makes significant capital investments to build new fabs and facilities or expand existing premises – Only in 2024, billions and billions of dollars were poured into more than one hundred new investments. ... <a title="Advancing Semiconductor Performance: An Effective and Cost-Efficient Breakthrough" class="read-more" href="https://www.sisusemi.com/blog/advancing-semiconductor-performance-an-effective-and-cost-efficient-breakthrough/" aria-label="Read more about Advancing Semiconductor Performance: An Effective and Cost-Efficient Breakthrough">Read more</a></p>
<p>The post <a href="https://www.sisusemi.com/blog/advancing-semiconductor-performance-an-effective-and-cost-efficient-breakthrough/">Advancing Semiconductor Performance: An Effective and Cost-Efficient Breakthrough</a> appeared first on <a href="https://www.sisusemi.com">SisuSemi</a>.</p>
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										<content:encoded><![CDATA[
<p>The semiconductor industry is the backbone of modern technology, powering everything from smartphones to medical devices. To tackle these opportunities, the chip industry makes significant capital investments to build new fabs and facilities or expand existing premises – Only in 2024, billions and billions of dollars were poured into more than <a href="https://semiengineering.com/chip-industry-investments-kept-flowing-in-2024-even-as-some-projects-stalled/">one hundred new investments</a>. Yet, as the industry continues to innovate, manufacturers face challenges in improving product performance without increasing costs. A groundbreaking low-temperature silicon oxide passivation method (LT-UHV) (<a href="/what-we-offer">What we offer</a>) offers a solution that is both cost-effective and efficient.</p>



<h3 class="wp-block-heading"><strong>The challenge: Balancing innovation and cost</strong></h3>



<p>The interface between silicon (Si) and silicon oxide (SiOx) is present in most semiconductor devices, but defects at the SiOx/Si interface can degrade product performance. Historically, addressing these defects required high-temperature processes (&gt;700 °C) that:</p>



<ul class="wp-block-list">
<li>Increase manufacturing costs due to high energy use.</li>



<li>Complicate production by limiting compatibility with high temperature-sensitive materials like metals and polymers.</li>



<li>Heighten the risk of contamination and product variability.</li>
</ul>



<p>To stay competitive, manufacturers need innovative methods to improve performance without these drawbacks.</p>



<h3 class="wp-block-heading"><strong>The SisuSemi solution: A smarter approach</strong></h3>



<p>The new LT-UHV method operates below 450 °C, making it ideal for modern semiconductor manufacturing. It simplifies the production process while delivering tangible benefits:</p>



<p class="has-medium-font-size"><strong>1. Cost-efficient pre-treatment</strong></p>



<ul class="wp-block-list">
<li>Simplified Cleaning: Removes contaminants without high-temperature annealing.</li>



<li>Enhanced Efficiency: Improves material quality through precise, low-temperature heating.</li>
</ul>



<p class="has-medium-font-size"><strong>2. Advanced interface engineering</strong></p>



<ul class="wp-block-list">
<li>Introduces oxygen atoms at low temperatures to create a crystalline SiOx layer. This innovation minimizes defects that disrupt performance.</li>
</ul>



<p class="has-medium-font-size"><strong>3. Post-treatment compatibility</strong></p>



<ul class="wp-block-list">
<li>Can be applied also to completed components, reducing electrical losses in devices like photodiodes and sensors.</li>
</ul>



<h3 class="wp-block-heading"><strong>Key benefits for manufacturers</strong></h3>



<p class="has-medium-font-size"><strong>Improved device performance</strong></p>



<p>The SisuSemi technology significantly reduces defect densities, enhancing reliability and efficiency in electronic and photonic devices.</p>



<p class="has-medium-font-size"><strong>Cost savings</strong></p>



<p>By eliminating the need for energy-intensive high-temperature processes, this method reduces operational costs and energy consumption.</p>



<p class="has-medium-font-size"><strong>Sustainability</strong></p>



<p>Lower energy requirements align with green manufacturing goals, appealing to environmentally conscious markets.</p>



<p class="has-medium-font-size"><strong>Scalability</strong></p>



<p>The method integrates seamlessly into existing production workflows, ensuring manufacturers can adopt it without major disruptions.</p>



<h3 class="wp-block-heading"><strong>Real-world impact</strong></h3>



<p class="has-medium-font-size"><strong>Electronics</strong></p>



<p>Manufacturers can create more efficient transistors and capacitors, enabling smaller and more powerful devices.</p>



<p class="has-medium-font-size"><strong>Photonics and sensors</strong></p>



<p>Improved material quality enhances applications in medical imaging, telecommunications, and environmental monitoring.</p>



<p class="has-medium-font-size"><strong>Consumer appeal</strong></p>



<p>Products that are more reliable and energy-efficient strengthen brand reputation and customer trust.</p>



<p class="has-medium-font-size"><strong>Looking ahead</strong></p>



<p>The SisuSemi method (<a href="/contact">Contact us</a>) not only solves today’s challenges but also lays the groundwork for future advancements. As research continues, expect further improvements in scalability and compatibility, unlocking new opportunities in nanotechnology and advanced materials.</p>



<h3 class="wp-block-heading"><strong>Conclusion</strong></h3>



<p>This breakthrough in low-temperature passivation represents a turning point for the semiconductor industry. By offering a practical, cost-efficient, and sustainable solution, LT-UHV empowers manufacturers to innovate while maintaining profitability. As demand for high-performance, eco-friendly devices grows, this method positions manufacturers at the forefront of the industry’s future.</p>
<p>The post <a href="https://www.sisusemi.com/blog/advancing-semiconductor-performance-an-effective-and-cost-efficient-breakthrough/">Advancing Semiconductor Performance: An Effective and Cost-Efficient Breakthrough</a> appeared first on <a href="https://www.sisusemi.com">SisuSemi</a>.</p>
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		<title>Atomic-level defects and contamination: Impact on Power Consumption in Data Centers</title>
		<link>https://www.sisusemi.com/blog/atomic-level-defects-and-contamination-impact-on-power-consumption-in-data-centers/</link>
		
		<dc:creator><![CDATA[KimWesterlund]]></dc:creator>
		<pubDate>Thu, 20 Feb 2025 09:09:47 +0000</pubDate>
				<category><![CDATA[Blog]]></category>
		<guid isPermaLink="false">https://sisusemi.iwn.co/?p=15</guid>

					<description><![CDATA[<p>Before rapid introduction of generative AI, power consumption in data centers was recognized to be a major issue, but nobody was capable to see how much energy would be needed to power AI systems. AI power demand is expected to surge 550% by 2026, from 8 TWh in 2024 to 52 TWh, before rising another ... <a title="Atomic-level defects and contamination: Impact on Power Consumption in Data Centers" class="read-more" href="https://www.sisusemi.com/blog/atomic-level-defects-and-contamination-impact-on-power-consumption-in-data-centers/" aria-label="Read more about Atomic-level defects and contamination: Impact on Power Consumption in Data Centers">Read more</a></p>
<p>The post <a href="https://www.sisusemi.com/blog/atomic-level-defects-and-contamination-impact-on-power-consumption-in-data-centers/">Atomic-level defects and contamination: Impact on Power Consumption in Data Centers</a> appeared first on <a href="https://www.sisusemi.com">SisuSemi</a>.</p>
]]></description>
										<content:encoded><![CDATA[
<p>Before rapid introduction of generative AI, power consumption in data centers was recognized to be a major issue, but nobody was capable to see how much energy would be needed to power AI systems. AI power demand is <a href="https://www.forbes.com/sites/bethkindig/2024/06/20/ai-power-consumption-rapidly-becoming-mission-critical/" target="_blank" rel="noopener">expected to surge 550% by 2026</a>, from 8 TWh in 2024 to 52 TWh, before rising another 1150% to 652 TWh by 2030.</p>



<p>Semiconductor chip power consumption and cooling requirements are the main causes of data center energy consumption. This calls for considering <a href="https://semiengineering.com/managing-the-huge-power-demands-of-ai-everywhere/">energy efficiency at all stages of the chip development and manufacturing processes.</a></p>



<p>Atomic-level defects and contamination in semiconductor interfaces significantly impact the power consumption of data centers. These defects disrupt the normal flow of electrons, leading to increased leakage current and reduced energy efficiency.</p>



<p>Defects and contamination create additional energy states within the band gap of semiconductors, allowing electrons to flow more easily even when the device is supposed to be in an &#8220;off&#8221; state. This results in increased leakage current. In data centers, where thousands of servers are constantly running, increased leakage current can lead to significant energy losses.</p>



<p>Atomic-level impurities degrade the performance of transistors and other semiconductor devices, making them less efficient at switching and processing data. Lower energy efficiency means that more power is required to perform the same amount of work. This can lead to higher overall energy consumption in data centers. For instance, the average energy consumption was calculated to be 1.15 kWh/cm² based on a <a href="https://www.sciencedirect.com/science/article/pii/S2666445323000041">study on semiconductor manufacturing industry.</a></p>



<h3 class="wp-block-heading">Consequences for data center finances</h3>



<p>Increased power consumption directly translates to higher electricity costs. Data centers are already major consumers of electricity, and any inefficiency can significantly increase operating costs. Higher operating costs reduce profit margins and require additional budget allocations for energy expenses.</p>



<p>Higher power consumption generates more heat, which requires more cooling to maintain optimal operating temperatures. Increased cooling costs add to the overall financial burden, further straining the data center’s budget.</p>



<h3 class="wp-block-heading">Consequences for sustainability</h3>



<p>Data centers are significant contributors to carbon emissions due to their high energy consumption. Inefficiencies caused by defects and contamination exacerbate this issue. A larger carbon footprint can harm the data center’s sustainability goals and reputation, as environmental regulations and consumer expectations become more stringent.</p>



<p>Efforts to implement energy-saving measures, such as using renewable energy sources or optimizing power usage, may be undermined by inefficiencies at the semiconductor level. This can hinder progress towards sustainability targets and certifications, such as LEED or Energy Star ratings.</p>



<h3 class="wp-block-heading">Consequences for operations</h3>



<p>Defects and contamination can lead to unpredictable device failures and performance degradation over time. Lower reliability can result in more frequent downtime and maintenance requirements, affecting the data center’s ability to provide consistent and reliable services.</p>



<p>More frequent failures and performance issues require additional maintenance and repairs. Higher maintenance costs and increased workload for technical staff can strain operational resources and budgets.</p>



<h3 class="wp-block-heading">Mitigation opportunities</h3>



<p>To address these issues, data center operators and semiconductor manufacturers can employ several strategies:</p>



<ul class="wp-block-list">
<li><strong>High-Quality Semiconductor Materials</strong>: Using high-purity materials to minimize defects and contamination.</li>



<li><strong>Regular Maintenance and Monitoring</strong>: Implementing rigorous maintenance schedules and real-time monitoring to detect and address issues early.</li>



<li><strong>Energy-Efficient Designs</strong>: Incorporating energy-efficient hardware and software solutions to optimize power usage.</li>



<li><strong>Renewable Energy Sources</strong>: Investing in renewable energy sources to reduce the carbon footprint and energy costs.</li>
</ul>



<p>In addition, there is a major opportunity in the utilization of <strong>new innovative fabrication technologies</strong>, such as <a href="/what-we-offer" target="_blank" rel="noopener"><strong>SisuSemi</strong></a>, that will clean semiconductor interfaces from atomic-level impurities and make the surfaces ordered, significantly reducing leakage currents and energy consumption. Thus, data centers can mitigate the impacts of atomic-level defects and contamination, improving their financial, sustainability, and operational performance.</p>
<p>The post <a href="https://www.sisusemi.com/blog/atomic-level-defects-and-contamination-impact-on-power-consumption-in-data-centers/">Atomic-level defects and contamination: Impact on Power Consumption in Data Centers</a> appeared first on <a href="https://www.sisusemi.com">SisuSemi</a>.</p>
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