SisuSemi technology is based on the strong materials research in Finland that includes nanomaterials, renewable energy materials, smart materials, and sustainable materials development. E.g. ALD, Atomic Layer Deposition technology was invented in Finland in the mid-70´s, and since then it has sparked multiple new innovations and new business activity.

The roots of the SisuSemi technology are in the University of Turku, Finland, with materials research focus on advanced materials, nanotechnology, and sustainable energy materials. First patents protecting the SisuSemi technology are from 2015. The inventors of the technologies are strongly involved in the SisuSemi research and development activities. All the IPR developed in the University of Turku has been transferred to SisuSemi, and SisuSemi has sole rights to utilize and commercialize these patents. Company´s strong patent portfolio effectively protects its businesses globally.

SisuSemi has been established to transform the way semiconductor manufacturers address atomic-level impurities at semiconductor interfaces, thus greatly enhancing the performance of semiconductor chips and also optimizing production efficiency. In doing that we focus on continuous innovation, commitment to quality and succeeding together with our customers.