Challenges of ALD process in semiconductor manufacturing

Driven by the rising usage in the manufacturing of new and advanced chips and the growing adoption of compact or miniature devices, Atomic Layer Deposition (ALD) is one of the best methods for producing thin films. While ALD is highly effective for depositing thin films with precision, recent research has shown it has inherent challenges, … Read more

Atomic-Level Cleanliness: The Next Frontier in Semiconductor Fabrication

In recent years, awareness of surface defects has increased but not yet fully realized in the semiconductor industry. This is due to several factors, ranging from missing suitable characterization tools at fabrication lines to the lack of solutions to tackle these issues. For decades, semiconductor fabrication has focused on minimizing defects. However, as node size … Read more