When the Foundation Cracks: How Pre-ALD Surface Defects Undermine Atomic Layer Deposition
Atomic Layer Deposition has earned its place as the workhorse of advanced-node manufacturing. Its self-limiting, layer-by-layer chemistry gives fabs something no other deposition method can match: Ångström-level thickness control and near-perfect conformality across the most complex 3D structures — nanosheet channels, high-aspect-ratio contacts and DRAM capacitor stacks. But ALD’s precision rests on an assumption that … Read more