PasiPietila Leakage current is a critical limiter of sensor performance, yield, and reliability. The leakage current is one of the few parameters that directly impacts both yield and product pricing. Across a typical sensor portfolio, leakage reduction at BEOL can unlock $10–25M annual value. In this case study, SisuSemi is introducing a new low‑temperature (200 °C) BEOL‑compatible … Read more
New BEOL-compatible AtomSeal process unlocks up to $25M annual value per product line for semiconductor sensor manufacturers — without front-end redesign. SisuSemi (www.sisusemi.com), the leading provider of Atomic Level Purification (ALP™) solutions, announced today a significant advancement in its process portfolio: a Back-End-Of-Line (BEOL)-compatible ALP™ process called AtomSeal, operating at a temperature of 200 °C … Read more
In the semiconductor industry, we often find ourselves caught between two worlds: the infinitesimal realm of quantum mechanics and the high-stakes theater of global business. For executives, the focus is on yield, power budgets and market competitiveness. For engineers, the daily grind involves managing dangling bonds and oxide disorders. The bridge between these two worlds … Read more
For semiconductor professionals, the battle for yield has always been fought at ever-shrinking scales. But since the turn of the millennium, we have entered a new era: the atomic battlefield. Defects are no longer just killer particles; they are misplaced atoms, lattice vacancies and interfacial contamination measuring less than a nanometer. As we scale towards … Read more
For CMOS imaging sensor (CIS) manufacturers, atomic-scale contamination is no longer a background variable — it is a primary driver of yield loss, noise performance and product reliability. CMOS image sensors have become one of the most defect-sensitive device categories in semiconductor manufacturing. Every pixel in a CIS die must convert photons to electrons with … Read more
In the race toward ever-smaller and more powerful semiconductor devices, the margin for error has become vanishingly thin. At advanced process nodes — like 5nm, 3nm, and beyond — even atomic-level imperfections can spell disaster. Among the critical steps in semiconductor manufacturing, lithography is particularly vulnerable to the often-overlooked evil of atomic-level defects and contamination … Read more
Turku, Finland – March 31st, 2026 SisuSemi has partnered with IPG Photonics, the world leader of fiber laser technology, to introduce a breakthrough Ultra‑High‑Vacuum (UHV) wafer cleaning system that pairs atomic‑level cleanliness with a first‑of‑its‑kind laser‑based wafer heating technology. The system supports wafer sizes up to Ø300 mm, with full flexibility to process Ø200 mm … Read more
As chips become smaller and more powerful, one tiny layer – just a few atoms thick – now determines whether a product meets its performance, power, and reliability targets. That layer is the silicon oxide interface between the transistor and the rest of the device. And today, most of the industry still relies on chemically … Read more
Leakage current is an increasingly visible constraint in modern semiconductor technology causing limitations for business and component performance. In advanced devices with smaller node sizes, even small unwanted currents can significantly impact power consumption, device reliability, signal integrity, and manufacturing yield. This makes reducing leakage current vital. This article explains what leakage current is, why … Read more
ALP™ (Atomic Level Purification) is a semiconductor interface engineering methodology designed to restore atomic lattice order, reduce carbon and hydrogen contamination, and suppress interface trap density (Dit) at advanced 2 nm and 3 nm technology nodes and beyond. In this blog we go deeper why this is needed, and what are the reasons why this … Read more