News

SisuSemi Extends ALP™ Technology to Back-End-Of-Line Processes, Demonstrating 58% Leakage Current Reduction at Temperature of 200 °C

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New BEOL-compatible AtomSeal process unlocks up to $25M annual value per product line for semiconductor sensor manufacturers — without front-end redesign. SisuSemi (www.sisusemi.com), the leading provider of Atomic Level Purification (ALP™) solutions, announced today a significant advancement in its process portfolio: a Back-End-Of-Line (BEOL)-compatible ALP™ process called AtomSeal, operating at a temperature of 200 °C … Read more

SisuSemi utilizes IPG Photonics Laser Solution to revolutionize the semiconductor industry

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Turku, Finland – March 31st, 2026 SisuSemi has partnered with IPG Photonics, the world leader of fiber laser technology, to introduce a breakthrough Ultra‑High‑Vacuum (UHV) wafer cleaning system that pairs atomic‑level cleanliness with a first‑of‑its‑kind laser‑based wafer heating technology. The system supports wafer sizes up to Ø300 mm, with full flexibility to process Ø200 mm … Read more

SisuSemi Strengthens Global IP Portfolio with New Patent Grants in Japan, Taiwan, and Europe 

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Turku, Finland – August 29, 2025    We are proud to announce that SisuSemi has recently secured national patent grants in Japan, Taiwan, and through the European Patent Office (EPO), marking a significant milestone in the expansion of our international intellectual property portfolio.    These newly granted patents reinforce our commitment to pioneering innovation in semiconductor surface cleaning … Read more