Unlock hidden opportunities in semiconductor manufacturing with customer opportunity assessment

In the high-stakes world of semiconductor manufacturing, every fraction of a nanometer matters. Yet, many companies—whether IDMs, foundries, or fabless companies—are unknowingly losing performance, quality, and yield due to atomic-level defects and contamination on their chip surfaces.

Despite investing heavily in advanced fabrication techniques, many semiconductor manufacturers are unaware of how microscopic contaminants are impacting their business-critical metrics, such as defect density, power efficiency, and product reliability. Or worse, they acknowledge the issue but haven’t found a practical, cost-effective way to address it.

At SisuSemi, we bridge this gap with our customer opportunity assessment—an advanced impurity assessment that uncovers hidden opportunities for improvement in your semiconductor manufacturing process.

Are you overlooking a major performance and yield bottleneck?

Many semiconductor companies prioritize efficiency, cost reduction, and process optimization, but atomic-level defects and contamination are often ignored in these discussions. Why? Because their impact isn’t always immediately visible. However, these contaminants can:

  • Reduce yield rates—leading to significant financial losses in high-volume manufacturing.

  • Impact chip reliability—causing failures in critical applications, from AI chips to automotive semiconductors.

  • Increase defect density—lowering product performance and increasing rework or scrap rates.

With process nodes shrinking and performance demands increasing, even the smallest atomic-scale contamination can cause major issues.

Customer opportunity assessment: Uncovering what you can’t see

Our customer opportunity assessment leverages state-of-the-art impurity detection equipment to provide an in-depth assessment of your semiconductor surfaces. We offer a structured, data-driven approach to help you make informed decisions on improving chip quality and manufacturing yield.

How It Works:

  • Advanced Surface Analysis – We use cutting-edge techniques like:

    • X-ray Photoelectron Spectroscopy (XPS) – Identifies chemical composition and chemical state of the surface. Point measurement and mapping possible.

    • Scanning Electron Microscopy (SEM) – Identifies the surface topography.

    • Energy Dispersive X-ray Spectroscopy – Identifies chemical composition of the surface. 

    • Atomic Force Microscopy (AFM) – Measures surface roughness.

    • Low Energy Electron Diffraction – Identifies the crystal structure of surface reconstruction. 

    • Scanning Tunneling Microscopy – Images surface at atomic level and provides information about electronic structure of the surface

  • Comparative Benchmarking – We assess your contamination levels against industry standards and best practices.

  • Quantifiable Business Impact – Our reports don’t just show impurity data—they correlate contamination levels with yield loss, quality issues, and potential cost savings.

  • Actionable Recommendations – If impurity levels are affecting your process, we outline specific next steps to validate to feasibility of the SisuSemi solution against your specific KPIs, reduce impurities, improve yield, and enhance device performance.

Why should you act now?

The semiconductor industry is more competitive than ever. New materials, tighter design tolerances, and increasing chip complexity demand a proactive approach to contamination control.

By taking advantage of customer opportunity assessment, you gain:

  • A competitive edge—with improved manufacturing yield and reduced waste

  • Deeper process insights—to understand impurity impact at a scientific level

  • Lower production costs—by minimizing defect-related rework and inefficiencies.

Many companies don’t act until contamination becomes a crisis. But the most successful manufacturers take control early, leveraging advanced impurity insights to stay ahead of the curve.

Get started today

If you’re not actively monitoring atomic-level impurities, you might be missing a huge opportunity to optimize your production process.

Don’t let invisible defects and contamination limit your semiconductor innovation. Let SisuSemi help you unlock new opportunities—starting at the atomic level.

 

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Challenges of ALD process in semiconductor manufacturing