Carbon contamination must be reduced to obtain the best performance of Semiconductors

Classical chemical cleaning of semiconductors can lead to carbon contamination on the surface and sub-surface of semiconductors. This has been studied e.g. by Wan Tat Wat et al. at their paper ( https://ieeexplore.ieee.org/document/10121102 ).

The challenge of carbon contaminants in semiconductors is huge. They are causing problems such as electrical drift, leading to deviations in electrical functionality. It also complicates the oxide growth process on top of semiconductor process, affects dielectric breakdown strength, and induces spurious doping into silicon, degrading the overall device performance.

It's not only the surface and interface of silicon and oxide layers where the issues arise. Defects below the surface of silicon also impact performance.

Contamination introduced by chemicals is one issue. Adding to this the dry etching introduces more defects in the crystal structure and can leave contaminants on the silicon surface and sub-surfaces.

Any contaminant at Silicon surface or sub-surface can lead to degradation of the semiconductor component performance and reduced the line & chip yield. However, the Carbon-based contaminants are challenging as those are hard to remove with classical methods.

Hence, we should look for new solutions to tackle this issue.

From Classical to Novel Solutions

Classical cleaning solutions have done a great job historically, removing majority of contaminants and impurities as well as oxide layers. However, they don't tackle atomic-level cleanliness and the crystal structure of semiconductors.

Adding to this, they also can even introduce atomic-level contamination into the surface and sub-surfaces.

The novel solution offered by SisuSemi helps tackle these problems. Our solution ensures atomic-level cleanliness at the surface and sub-surface, as well as recovering the crystal structure. With help of this solution, you can remove organic impurities (and other unwanted contaminants such as oxygen and hydrogen) from semiconductors while creating a stable passivation layer to enable solid results when the wafer surface is exposed to the environment.

Check out more about our solutions and reach out to us to find out how we can boost your semiconductors.