Carbon contamination must be reduced to obtain the best performance of Semiconductors
Classical chemical cleaning of semiconductors can introduce carbon contamination on both the surface and sub-surface layers. This phenomenon has been studied by Wan Tat Wat et al. in their paper (https://ieeexplore.ieee.org/document/10121102). Carbon contamination presents significant challenges. It can cause electrical drift, leading to deviations in device functionality. It complicates oxide growth processes, reduces dielectric breakdown … Read more